Engineering & Technologyarticle2026-09-24

Antiferroelectric hafnia down to the 2D limit

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Abstract

Antiferroelectricity is a material property characterized by alternating electric dipoles spontaneously ordered in antiparallel directions. Antiferroelectrics are promising for energy storage, solid-state cooling, and memory technologies; however, these materials are scarce, and their scalability remains largely unexplored. In this work, we demonstrate that single-crystalline hafnia, a lead-free CMOS-compatible material, exhibits antiferroelectricity under compressive-strain conditions. We observe antiparallel sublattice polarization and stable double-hysteresis in single-crystalline (111)-oriented epitaxial La-doped hafnia films grown on yttrium-stabilized zirconia and show that the antipolar orthorhombic phase of hafnia adheres to the Kittel model of antiferroelectricity. Notably, compressive strain strengthens the orthorhombic order in thinner La-doped hafnia films, achieving a very high ordering temperature of 850°C in the two-dimensional limit, highlighting hafnia’s potential for advanced antiferroelectric devices.

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Authors: Xin Li, Guodong Ren, Haidong Lu, Kartik Samanta, Pravan Omprakash, Yu Yun, Pratyush Buragohain, Huibo B. Cao, Jordan A. Hachtel, Andrew R. Lupini, Miaofang Chi, Evgeny Y. Tsymbal, Alexei L. Gruverman, Rohan Mishra, Xiaoshan Xu

Institutions: University of Washington, Washington University in St. Louis, University of Nebraska–Lincoln, Oak Ridge National Laboratory, Jaypee Institute of Information Technology, Pacific Northwest National Laboratory