Materials & Energyarticle2026-08-18

Gate-imprinted memory and light-induced erasure of superconductivity at KTaO3-based interfaces

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Abstract

Realizing non-volatile control of superconductivity is a key step toward integrating memory and quantum functionality in future information technologies. KTaO₃-based heterostructures uniquely host interfacial two-dimensional superconductivity and quantum paraelectric lattice background. The coupling between these two degrees of freedom potentially provides a promising route to encode memory into the superconducting state. Here we reveal two intertwined phenomena in AlOₓ/KTaO₃ heterostructures: a gate-imprinted memory in which electrostatic gate cycling promotes superconductivity, and its erasure by optical illumination at cryogenic temperatures. These phenomena arise from a previously unrecognized interplay between the superconducting interface and emergent lattice excitations including polar-nanoregion reorientation and charge trapping/detrapping by oxygen vacancies. These results demonstrate configurable superconductivity at correlated oxide interfaces, opening a pathway to enrich dissipationless transport with non-volatile controls for superconducting elements. Non-volatile control of superconductivity is desirable for integrating memory with quantum devices. Here, the authors show that gate cycling imprints superconducting memory in AlOx/KTaO3 heterostructures, which can be erased optically via lattice excitations and vacancy trapping, both actions feasible at cryogenic temperatures.

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View paper (DOI)Open access versionOpenAlexNature CommunicationsPublished 2026-08-18

Authors: Zhihao Chen, Pengxu Ran, Ming Dong Dong, Jiexiong Sun, Fengmiao Li, Zhixin Yao, Lei Liu, J. Wu, Juan Jiang, Zhi Gang Cheng

Institutions: Chinese Academy of Sciences, Peking University, University of Chinese Academy of Sciences, Westlake University, University of Science and Technology of China, Hefei University of Technology, National Laboratory for Superconductivity, Institute of Physics, Hefei National Center for Physical Sciences at Nanoscale, Hefei University