Formation and Mitigation of Carbon Contamination in Electron‐Beam Measuring Instruments

Abstract

ABSTRACT Carbon contamination in electron‐beam measuring instruments is a common problem that adversely affects sample observation and analysis. Although numerous scholars have conducted systematic and in‐depth research on this issue, identifying optimal imaging conditions to minimize contamination and developing effective mitigation strategies remain key challenges. Carbon contamination primarily occurs when the electron beam interacts with hydrocarbon molecules, leading to the deposition of a carbon film. This film can obscure structures of interest and degrade image resolution. This paper investigates the formation mechanisms and growth models of carbon contamination in measuring instruments and quantifies the effects of accelerating voltage, beam current, and organic species on the contamination process. Furthermore, it explores various mitigation techniques, including heat baking, plasma cleaning, ultraviolet cleaning, gas introduction methods, and electron‐beam‐induced etching.