Engineering & Technologyarticle2026-08-11

Healing intervention for improving the efficiency and stability of tandem devices on industrial textured silicon

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Abstract

Monolithic perovskite/silicon tandem solar cells are widely regarded as the next-generation, low-cost, high-efficiency photovoltaic technology. However, achieving high-quality wide-bandgap perovskite top cells on industrial textured silicon, particularly using hybrid two-step deposition methods that combine sequential co-evaporation and solution processing, remains a major challenge. In this work, we introduce a healing intervention strategy that significantly tailors perovskite film growth and enhances the film quality on textured silicon substrates. By applying an MASCN solution to heal the as-prepared films, which induces secondary crystal growth to enhance overall perovskite crystallization, we obtain a conformal perovskite layer characterized by columnar grains that extend through the full film thickness. The resulting 1.68 eV wide-bandgap perovskite solar cells achieve a champion efficiency of 21.1%, contributing to a certified stabilized tandem efficiency of 30.77% and an impressive Voc of 1.915 V over an active area of 1.164 cm². Notably, an encapsulated device retains its initial performance after 3400 hours of continuous maximum power point tracking under one-sun illumination in ambient conditions, representing the excellent stability in perovskite/silicon tandem cells reported to date. Perovskite–silicon tandem solar cells offer efficient, low-cost energy, but forming high-quality perovskite films on textured silicon remains challenging. Kong et al. applied a healing treatment that improved crystal growth, efficiency, and long-term stability.

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View paper (DOI)Open access versionOpenAlexNature CommunicationsPublished 2026-08-11

Authors: Wenchi Kong, Haowen Luo, Bowen Yang, 索佳佳, Xuanpu Qu, Ruiyan Li, Tianqi Wei, Jiajia Hong, Xinrui Han, Xuntian Zheng, Henan Feng, Lu Zhao, Zijing Chu, Mingliang Li, Renxing Lin, Wenhua Zhang, Hairen Tan

Institutions: Uppsala University, Nanjing University, Collaborative Innovation Center of Advanced Microstructures, Yunnan University, Suzhou University of Technology, Advanced Laser Technology (United Kingdom)