Center for Functional Nanomaterials

Impact of plasma conditioning-state evolution on Cl2/Ar plasma-assisted Si atomic layer etching

Plasma-assisted atomic layer etching (ALE) requires tightly controlled plasma conditions to achieve reproducible self-limiting material removal; however, the temporal stability of conditioned plasma environments and their influence on etching behavior remain insufficiently unders...

Design principle for mitigating moisture-induced degradation in 2D halide perovskites

We establish a conceptual framework which explains and mitigates moisture-induced degradation in 2D perovskites. Degradation proceeds along defined pathways across the spacer cation iodide (A′I or A′I2)-PbI2-H2O ternary phase diagram as moisture intercalates into the perovskite....