UV and EB nanoimprint lithography — the 3Dresyns NMF photoresist family

Abstract

This white paper covers UV and electron-beam nanoimprint lithography through the 3Dresyns NMF photoresist family, including stamp, resist and nano/micro fabrication routes. NIL performance depends on resist viscosity, curing route, demoulding, pattern fidelity, shrinkage, adhesion and stamp compatibility. The NMF family is positioned as a nano/micro fabrication material system.