Microscopic Injection, TLM Transfer Length, and Lateral Contact-Edge Resistance in Monolayer MoS2

Abstract

Final corrected validation package for the computational research note on Bi/MoS2 contact-edge transport. Version 1.2.0 retains the Landauer correction introduced in version 1.1.0: the ideal width-normalized resistance is 43.86 ohm um, required mean transmission is 0.627, and the corrected effective-barrier range over 2.0-2.9 nm is 0.55-5.43 meV. This version adds a converged screened-Poisson and ballistic effective-mass NEGF cross-check, contact-material comparison, step-by-step experimental validation protocol, device matrix, raw-data template, and explicit match/not-matched/inconclusive criteria. It also includes public TLM-code reproduction and image-level XSTM refits. The package clearly separates literature results, derivations, simulations, interpretations, and limitations. This is a computational note and independent secondary validation, not new experimental replication or a peer-reviewed article.