Oxford Instruments (United Kingdom)

Impact of plasma conditioning-state evolution on Cl2/Ar plasma-assisted Si atomic layer etching

Plasma-assisted atomic layer etching (ALE) requires tightly controlled plasma conditions to achieve reproducible self-limiting material removal; however, the temporal stability of conditioned plasma environments and their influence on etching behavior remain insufficiently unders...

Emerging 4D printed biomedical wearable devices

Abstract This article offers a comprehensive overview of the advancements in 4D printed biomedical wearable devices. It begins by discussing various three-dimensional printing methods, exploring their specific advantages and applications in the biomedical field. The article highl...

An integrated sedimentological, PXRD, and PXRF approach to resolve facies ambiguity in peritidal carbonates: a case study from the Upper Ordovician Saluda Formation

ABSTRACT The inherent subjectivity and limited reproducibility of facies descriptions are widely recognized. These challenges are exemplified in variably dolomitized, peritidal mixed carbonate–siliciclastic deposits where traditional sedimentological facies analyses rely heavily...