Modern Electron (United States)

Transient CFD-GuidedFast-Cycle ALD: Effects of ReactorConfiguration and Process Window

Abstract Atomic layer deposition (ALD) is a powerful vapor-phase thin-film technique that relies on sequential, self-limiting surface reactions to achieve atomic-scale thickness control and excellent conformality on three-dimensional substrates. In practical reactors, however, th...

Beyond Traditional Phenolics: Disulfide Bonds for Performance Enhancement of Aerospace Ablation‐Resistant Materials from Processing to Recycling

As a key material of solid rocket motor nozzles, phenolic resins (PR) possessing high char yield, good processability, and efficient repairable performance are strongly desired for advanced ablation materials. Achieving these requirements simultaneously is challenging for traditi...