Leibniz Institute for Solid State and Materials Research

Atomically thin amorphous carbon with an ultralow dielectric constant

Two-dimensional (2D) materials could replace conventional electronic components. Key advances have already been made in applying 2D materials to integrated circuits, but a robust, atomically thin ultralow-k dielectric remains crucial for further circuit scaling. Minimizing parasi...

Enhanced Growthin Sb2Te3/SnSe2 Multilayered AtomicLayer Deposition: Nucleation and NanostructureModification

Abstract Multilayer thin film structuring offers a versatile strategy to tailor nanostructures through interface engineering. Atomic layer deposition (ALD) provides precise control of composition and structure via supercycle approaches that enable the multiple metal species intro...