Zhiyi Xie

Interference-governed electromagnetic-thermal coupling and heat transport in multilayer nanofilms under pulsed extreme-ultraviolet irradiation

Mo/Si multilayer mirrors are central to extreme ultraviolet (EUV) lithography, where nanoscale optical interference and heat accumulation together constrain reflectivity and operational stability. Conventional surface-flux-based models become inadequate for EUV multilayers becaus...