Yong-Xin Liu

Etching behavior of Y2O3 coatings in a capacitively coupled NF3/Ar/O2 plasma: Effects of bias power and pressure

Yttrium oxide (Y2O3) has been widely used as a protective coating for the inner surfaces of semiconductor process chambers. In NF3-containing plasmas, corrosion may cause coating thinning and surface morphology reconstruction, thereby affecting in-service reliability. To elucidat...