Sun Jeong Hwang

Design Optimization of Focus Ring Geometry for Improved Wafer-Edge Ion Energy-Angle Distributions in Pulsed Capacitively Coupled Plasma Etching

Wafer-edge uniformity in semiconductor etching is a key quality metric directly linked to device yield and is strongly governed by the local sheath structure near the wafer edge-focus ring boundary. However, the relative effects of focus ring geometry, dielectric material, and ap...