Ralf Tonner

Precursor Design Principles for Area‐Selective Atomic Layer Deposition of Alumina: Quantifying the Role of Lewis Acidity, Steric Repulsion, and Dimerization in Surface Adsorption

ABSTRACT In atomic layer deposition (ALD), precursor adsorption plays a critical role in determining growth characteristics. This is particularly important in area‐selective ALD (AS‐ALD), where adsorption on the non‐growth surface (NGS) leads to selectivity loss. In this context,...