Michal P. Prochazka

Boron-assisted stabilization of low-resistivity mixed-valence Cu–O thin films prepared by reactive magnetron sputtering

This study systematically investigated the influence of boron incorporation in Cu-O thin films and the effect of oxygen partial pressure ($p_{\rm ox}$) on the phase evolution, chemical bonding, and electrical characteristics of the prepared films. A phase transition from Cu$_2$O...