María Teófila Vicente Herrero

Technostress and Insulin Resistance Risk: A Cross-Sectional Analysis of 104,175 Spanish Workers Using TyG, TyG-BMI, METS-IR, and SPISE Indices

Background: Technostress has emerged as a growing occupational health concern in increasingly digitalized workplaces. Although its psychological consequences have been extensively investigated, little is known about its potential association with metabolic health and insulin resi...