Jiawei Lv

Influence of substrate heating for microstructure and physical properties of Cu-Al-O thin film

We prepared Cu-Al-O thin films on silicon and quartz substrate by direct current (DC) reactive magnetron sputtering method. The substrate temperatures varied at room temperature (~25℃) and 200℃ with post-annealed at 900℃ in argon atmosphere for 3h. The results indicate that the f...