Frans Munnik

ALD of Tantalum and Titanium Phosphates Using Tris(dimethylamino)phosphine

Abstract Atomic layer deposition (ALD) of metal phosphates is increasingly explored for energy applications, yet the mechanisms governing phosphorus incorporation remain poorly understood. In this work, we introduce two novel ALD processes for amorphous tantalum phosphate and tit...

Disentangling surface and bulk properties of Ta3N5 photoanodes

Abstract Understanding how material and defect characteristics govern photoelectrochemical performance is essential for developing efficient and stable photoelectrodes. Although bulk properties are often emphasized, surfaces and interfaces can equally determine activity and stabi...