B. Mahdavipour

Particle in cell Monte Carlo collision simulations of capacitive Ar/Cl2 discharges: Pressure and voltage dependence

Chlorine plasma discharges and their mixtures are often used for etching semiconductors and metals. Here, the capacitive Ar/Cl2 discharge is studied using one-dimensional particle-in-cell/Monte Carlo collision simulations as the pressure, driving voltage amplitude, and the chlori...